Application of SF4:
carbon tetrafluoride is the largest amount of plasma etching gas in the microelectronics industry at present. It is a mixture of high purity gas and high purity oxygen of carbon tetrafluoride. It can be widely used in the etching of silicon, silicon dioxide, silicon nitride, phosphorous silicon glass and tungsten film materials.
For silicon and silicon dioxide systems, the selectivity of 45:1 can be obtained by adjusting the ratio of the two gases when using the reactive ion etching of cf4-h2, which is very useful for etching the silicon dioxide film on the polycrystalline silicon gate.
It is also widely used in surface cleaning of electronic devices, production of solar cells, laser technology, gas phase insulation, cryogenic refrigeration, leakage testing agent, control of space rocket attitude, and detergent in printing circuit production.
COA of CF4 Gas
| Item |
Index |
| CF4, %(V/V)≥ |
99.999 |
99.995 |
99.99 |
| N2, 10-6(V/V) ≤ |
4 |
20 |
40 |
| O2, 10-6(V/V) ≤ |
1 |
5 |
10 |
| CO2, 10-6(V/V) ≤ |
1 |
5 |
10 |
| CO, 10-6(V/V) ≤ |
0.3 |
0.5 |
1 |
| SF6, 10-6(V/V) ≤ |
1 |
1 |
5 |
| H2O, 10-6(V/V) ≤ |
1 |
5 |
10 |
| HF, 10-6(V/V) ≤ |
0.1 |
0.3 |
0.3 |
| TFC(CH2F2,CHF3,C2F3,C3F8),10-6(V/V) ≤ |
1 |
10 |
30 |
| Total impurity content, ppm (V/V) ≤ |
10 |
50 |
100 |
CF4 Specification
Parameter
Critical Assay |
Unit |
Company
Specification |
Analysis
Results |
Analysis Method |
| Tetrafluoromethane (CF4) |
%(v/v) |
99.999% Min |
>99.999% |
G.C |
| Oxygen(O2) |
v.ppm |
<1.0 |
<0.2 |
G.C |
| Nitrogen(N2) |
v.ppm |
<1.0 |
<0.6 |
G.C |
| Carbon Monoxide(CO) |
v.ppm |
<0.5 |
<0.2 |
G.C |
| Carbon Dioxide(CO2) |
v.ppm |
<0.5 |
<0.2 |
G.C |
| Sulfur Hexafluoride(SF6) |
v.ppm |
<0.2 |
<0.1 |
G.C |
| Trifluoromethane(CHF3) |
v.ppm |
<0.5 |
<0.1 |
G.C |
| Other Halocarbon(OFC)* |
v.ppm |
<1.0 |
<0.7 |
G.C |
| Total Hydrocarbon(THC)* |
v.ppm |
<0.5 |
<0.1 |
G.C |
| Moisture(H2O) |
v.ppm |
<0.5 |
<0.2 |
Moisture Analyzer |
| Acidity(as HF) |
v.ppm |
<0.1 |
<0.08 |
Acidity Analyzer |
| Total Contents Of Impurity |
v.ppm |
≤10.0 |
<10.0 |
G.C |
| Particale(>0.1μm) |
pcs/liter |
<10.0 |
<1.0 |
ICP-MS |
Company Profile
Qingdao Ruiming Blue Sky Energy Co., Ltd. is a large professional gas company. After nearly 20 years of development, our business is now all over the country and overseas.
Our core focuses are large-scale on-site energy supply, clean energy, retail, and engineering. We offer high-purity industrial gases like oxygen, nitrogen, and argon via cylinder and liquid gas delivery, along with customized gas equipment solutions. These services support diverse industries, including metallurgy, semiconductors, electronics, food, and healthcare.
Our services have played a vital role in many industries such as metallurgy, chemical industry, semiconductor, electronics, photovoltaic, food, medical industry, new materials, energy, environmental protection and so on.
Ruiming Gas's deep technical knowledge and all-round support have been highly valued by customers. This allows us to offer cost-effective and competitive solutions. We maintain a warm, reliable and professional attitude to ensure that our customers have a pleasant experience.
Our main product lineup includes:
Gas products such as argon, helium, hydrogen, carbon dioxide, propane, acetylene and nitrous oxide.
Bulk liquid gases: Liquid argon, Liquid Carbon Dioxide, liquid oxygen
, Liquid nitrous oxide,Liquid ethylene, Liquid ethane, etc.
Gas cylinders, cryogenic liquid cylinders, cryogenic storage tanks, T75 storage tanks.
We have a strong belief in the potential of gases. We continue to explore the application value of gas. Our vision is to be a leading global provider of industrial gases and services and we look forward to working with you.
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